Fe掺杂NiSe@NiS复合材料电子调制和界面协同促进析氧性能研究

阴雪利; 代小平

doi:10.1016/S1872-5813(23)60374-3

Fe掺杂NiSe@NiS复合材料电子调制和界面协同促进析氧性能研究

doi: 10.1016/S1872-5813(23)60374-3

阴雪利,
代小平^,

中国石油大学(北京) 化学工程与环境学院重质油国家重点实验室, 北京 102249

基金项目: 国家自然科学基金（22278425）资助

详细信息

通讯作者:
E-mail：daixp@cup.edu.cn

中图分类号: O646
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- 文章访问数: 185
- HTML全文浏览量: 77
- PDF下载量: 43
- 被引次数: 0
出版历程
- 收稿日期: 2023-05-12
- 修回日期: 2023-06-05
- 录用日期: 2023-06-06
- 网络出版日期: 2023-06-27
- 刊出日期: 2023-10-10

Electronic modulation and synergistic effect on Fe-doped NiSe@NiS composites to improve oxygen evolution performance

YIN Xue-li,
DAI Xiao-ping^,

College of Chemical Engineering and Environment, State Key Laboratory of Heavy Oil Processing, China University of Petroleum Changping, Beijing 102249, China

Funds: The project was supported by the National Natural Science Foundation of China (22278425)

摘要

摘要: 本研究采用溶剂热法，在泡沫镍（NF）基底上原位合成出Fe掺杂的硒化镍和硫化镍复合材料（Fe-NiSe@NiS/NF）。得益于Fe掺杂优化的电子结构、NiSe和NiS间的协同效应以及高效的电荷转移速率，Fe-NiSe@NiS/NF在1 mol/L KOH溶液中表现出优异的OER性能。在过电位为330 mV时可实现电流密度150 mA/cm²，且电压在稳定40 h后没有发生显著改变。
- NiSe@NiS复合材料 /
- Fe掺杂 /
- 协同效应 /
- 电子调制 /
- 析氧反应.
Abstract: In this paper, Fe-doped nickel selenide and nickel sulfide composites was in-situ grown on nickel foam (NF) to prepare Fe-NiSe@NiS/NF by solvothermal method. Benefit from the optimized electron structure by Fe doping, the synergistic effect of NiSe@NiS and faster electron transfer, Fe-NiSe@NiS/NF exhibited excellent OER activity with the overpotential of 330 mV at 150 mA/cm² in 1 mol/L KOH solution. The voltage barely changed after 40 h of test.
- NiSe@NiS composites /
- Fe doping /
- synergistic effect /
- electronic modulation /
- oxygen evolution reaction

HTML全文

FIG. 2706. FIG. 2706.

FIG. 2706. FIG. 2706.

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图 1 （a）泡沫镍，（b）Fe-NiSe/NF，（c）NiSe@NiS/NF，（d）Fe-NiSe@NiS/NF的SEM照片

Figure 1 SEM images of (a) NF, (b) Fe-NiSe/NF, (c) NiSe@NiS/NF and (d) Fe-NiSe@NiS/NF

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图 2 Fe-NiSe@NiS/NF的（a）TEM照片，（b）高倍TEM照片，（（c）−（e））HAADF-STEM照片和面扫mapping照片

Figure 2 (a) TEM image, (b) HR-TEM image, ((c)−(e)) elemental mapping image of Fe-NiSe@NiS/NF

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图 3 （a）XRD谱图；（b）催化剂的XPS全谱图；（c）Ni 2p；（d）Fe 2p；（e）Se 3d；（f）S 2p

Figure 3 (a) XRD patterns, (b) full spectrum, (c) Ni 2p, (d) Fe 2p, (e) Se 3d, (f) S 2p

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图 4 （a）极化曲线；（b）塔菲尔斜率；（c）奈奎斯特曲线；（d）Fe-NiSe@NiS/NF稳定性测试

Figure 4 (a) LSV curves, (b) Tafel plots, (c) Nyquist plots, (d) stability test of Fe-NiSe@NiS/NF

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图 5 在特定电压范围（0.90224 –1.0224 V vs. RHE）内不同扫描速率下的CV曲线：（a）NiS/NF；（b）Fe-NiSe/NF；（c）NiSe@NiS/NF；（d）Fe-NiSe@NiS/NF；（e）双电层电容；（f）基于ECSA的极化曲线

Figure 5 CV curves at the potential of 0.9224 –1.0224 V vs RHE with different scan rates of (a) NiS/NF, (b) Fe-NiSe/NF, (c) NiSe@NiS/NF, (d) Fe-NiSe@NiS/NF, (e) Measured capacitive currents, (f) Normalized LSV curves based on ECSA for NiS/NF, Fe-NiSe/NF，NiSe@NiS/NF and Fe-NiSe@NiS/NF

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图 6 不同铁含量的Fe-NiSe@NiS/NF的（a）极化曲线；（b）奈奎斯特曲线；（(c)–(e)）在特定电压范围（0.9224 –1.0224 V vs. RHE）内不同扫描速率下的CV曲线；（f）双电层电容

Figure 6 (a) LSV curves, (b) Nyquist plots, ((c)–(e)) CV curves at the potential of 0.9024 –1.0024 V vs. RHE with different scan rates (20–100 mV/s) on Fe-NiSe@NiS/NF with different Fe content, (f) Measured capacitive currents

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表 1 ICP测试

Table 1 Results of ICP

Catalyst ICP-MS w/%
Ni Fe

Fe-NiSe@NiS/NF-1 47.28 1.93
Fe-NiSe@NiS/NF-3 41.35 4.61
Fe-NiSe@NiS/NF-5 39.47 8.03

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